Ceramic Heaters
Rapid Heating, High-Temp Durability
This series of ceramic discs uses high-purity aluminum nitride (AlN) ceramic as the substrate. They are precision-machined and manufactured using a high-temperature co-firing process. Primarily used inside high-end precision equipment, they perform functions such as wafer support, electrostatic adhesion, temperature control, and gas flow guidance. Custom manufacturing is available based on product drawings, dimensions, and groove/channel structures, making them compatible with various vacuum process equipment, including etching and thin-film deposition systems.The products are suitable for complex operating conditions such as high-temperature, vacuum, plasma, and corrosive gas chambers, and can perform functions including electrostatic adhesion for wafer support, process gas flow guidance, and uniform heat conduction within the chamber. They are suitable for use in electronic engineering equipment components, electrostatic chucks (ESC), and high-purity heating modules, meeting high-purity requirements for no metal ion leaching, low particulate matter, and low volatile contamination, thereby helping to improve process yield and equipment stability.
Product Description
Ceramic heating plates use ceramic materials as both an insulator and a heat-conducting medium, with a heating layer formed on their surface or inside to achieve stable heating. Compared to traditional metal heating elements, ceramic solutions facilitate thinner designs, uniform surface heating, and electrical insulation. They can also incorporate temperature sensing and protection features tailored to specific equipment operating conditions, making them ideal for heating modules requiring stable temperature fields and reliable insulation. Compared to traditional metal tubular heaters, ceramic heaters feature a more compact structure and a longer service life, and can be customized into circular, square, or other custom shapes to meet the mounting requirements of different equipment.
Applications
- Vacuum Process equipment: Workpiece support bases for securing workpieces and facilitating medium flow.
- Thin-film Process Equipment: Ceramic support bases for workpiece clamping and heat transfer.
- Heat Treatment Equipment: Ceramic flow channel discs for guiding the flow of cooling media and heat-transfer gases.
- Various Precision Industrial Equipment: Ceramic structural components requiring insulation, heat resistance, and low outgassing.
Advantages
- Stable Substrate Properties: High-purity aluminum nitride ceramic substrate with high thermal conductivity, excellent insulation performance, and low outgassing in vacuum environments, making it suitable for demanding process conditions.
- Complex Structural Machining: Capable of machining irregular structures such as annular grooves, spiral flow channels, and multiple sets of mounting and positioning holes to meet structural requirements for medium flow and workpiece clamping.
- Excellent Thermal Stability: Uniform heat conduction enables the parts to withstand thermal cycling caused by repeated heating and cooling, with strong resistance to thermal stress.
- Controllable Machining Accuracy: Flatness, groove depth, and hole diameter tolerances are controlled according to assembly requirements, ensuring assembly fit and interchangeability.
- Compatibility with Post-Processing: Supports secondary processing steps such as metallization and electrode printing.
- Highly Customizable: External dimensions, flow channel configurations, and hole layouts can all be adjusted to meet specific equipment operating conditions and drawing specifications.
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