Quartz Infrared Heating Tube

Low-Contamination UPW Heating

This halogen infrared lamp is specifically designed for DIW heating systems, serving as the core heating component in DIW modules for semiconductor wet processes. The lamp tube is constructed from high-purity quartz glass and high-performance tungsten filaments. It emits infrared radiation that penetrates the quartz water channel to provide non-contact heating for pure water. This product integrates seamlessly with equipment temperature control systems to achieve rapid and stable water temperature management, meeting the stringent standards for fluid purity and thermal response required by advanced electronic engineering processes.

 

  • Compatible Equipment: Deionized Water Heating Modules
  • Operating Voltage: 208 V (can be customized to meet different plant voltage requirements; standard units available)
  • Rated Power: 4000W (Multiple power models available to accommodate different chambers)
  • Design: Straight-tube infrared halogen lamp

Product Description

This halogen infrared lamp serves as the heat source component for DIW/UPW inline heating units and is suitable as a replacement part during equipment maintenance.The lamp is typically installed on a lamp bracket or within a reflector chamber on the exterior of the heating module. It transfers heat to the outer wall of the quartz water channel via infrared radiation, thereby providing indirect, non-contact heating to the deionized water flowing through it. This heating method has relatively low thermal inertia, which improves temperature control response and allows it to work in conjunction with the equipment's temperature control circuit to heat and maintain the temperature of process water.

Applications

  • Deionized Water Heating Units: Widely used in deionized water unit heaters to provide a rapid-heating heat source for ultrapure water recirculation systems and spray rinse lines.
  • Chemical Solution Tank Heating: Serves as an external radiant heat source for various process fluid tanks and acid/alkali solution tanks, enabling rapid heating and temperature maintenance of process liquids while preventing cross-contamination.
  • Semiconductor and Precision Electronics Manufacturing: Covers wet cleaning and fluid heating processes in the manufacturing of integrated circuits, photovoltaic silicon wafer texturing, LCD/OLED display panels, and precision optical lenses.
  • High-Purity Fluids and Medical/Pharmaceutical Applications: Suitable for non-contact heating systems used in laboratory heating of high-purity chemicals, preparation of pure water for biopharmaceuticals, and medical-grade fluids.

Advantages

  • Non-contact Heating Ensures High Purity: The lamp emits radiant heat from the outside and does not come into physical contact with the fluid during operation, preventing the leaching of metal ions.
  • Low Thermal Inertia, Rapid Temperature Control Response: Fast heating and cooling; when integrated with the machine's temperature control system, it responds quickly to flow rate changes and suppresses water temperature overshoot.
  • Standard Specifications for Easy Maintenance and Replacement: Electrical parameters compatible with equipment are provided. Thanks to the dry-wet separation design, lamp replacement requires no disassembly of the water circuit, saving time and effort.
  • Stable Light and Heat Output with a Long Service Life: Featuring a highly light-transmissive quartz tube and an oxidation-resistant encapsulation process, the lamp exhibits stable light decay even during continuous high-power operation, ensuring long-lasting and stable thermal conversion efficiency.
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